{"id":5089,"date":"2014-12-19T08:41:42","date_gmt":"2014-12-19T08:41:42","guid":{"rendered":"http:\/\/localhost:8080\/sk-hynix-and-toshiba-forge-extended-collaboration\/"},"modified":"2026-07-29T15:04:56","modified_gmt":"2026-07-29T06:04:56","slug":"sk-hynix-and-toshiba-forge-extended-collaboration","status":"publish","type":"post","link":"https:\/\/news.skhynix.com\/en\/sk-hynix-and-toshiba-forge-extended-collaboration\/","title":{"rendered":"SK hynix and Toshiba Forge Extended Collaboration"},"content":{"rendered":"<p><strong>SEOUL, Korea, December 19th, 2014<\/strong><br \/>\nSK hynix Inc. (<a class=\"-as-ga\" href=\"http:\/\/www.skhynix.com\" target=\"_blank\" rel=\"noopener noreferrer\" data-ga-category=\"sk-hynix-newsroom\" data-ga-action=\"click\" data-ga-label=\"goto_http:\/\/www.skhynix.com\">www.skhynix.com<\/a>) today announced that it will jointly develop a process technology \u2018Nano Imprint Lithography (or \u2018NIL\u2019)\u2019 with Toshiba, a Japanese memory chip maker.<\/p>\n<p>NIL has been recognized as one of the next generation lithography techniques for implementing high throughput patterning at low costs unlike the traditional lithography methods. The memory semiconductor industry has demonstrated and developed many process technologies including EUV(Extreme Ultraviolet) in order to overcome technology limitations and NIL as one of the process technologies can achieve resolutions beyond the limitations.<\/p>\n<p>SK hynix and Toshiba expect that this collaboration will enable the two parties to successfully develop the NIL by minimizing risk and move up commercialization of this technology. Also once it is successfully commercialized, it is expected to make a significant contribution to the acceleration of cost competitiveness.<\/p>\n<p>SK hynix and Toshiba have also extended their collaborations by settling all outstanding claims, including the lawsuit that Toshiba filed last March against SK hynix alleging misappropriation of trade secrets following the arrest of a former SK hynix employee on suspicion of illegally taking trade secrets. The agreement fee is 278 million US dollars.<\/p>\n<p>SK hynix and Toshiba have also extended their patent cross licensing and product supply agreements.<\/p>\n<p>SK hynix will further focus on its technology competitiveness by putting legal dispute behind and expanding its collaboration with Toshiba. The ongoing joint development will be also progressing without any barrier. SK hynix and Toshiba have agreed on patent license agreement in 2007 and jointly developed the next generation memory \u2018STT-MRAM\u2019 from 2011.<\/p>\n<p>\u00a0<\/p>\n<p><strong>About SK hynix Inc.<\/strong><br \/>\nSK hynix Inc., headquartered in Korea, is the world\u2019s top tier semiconductor supplier offering Dynamic Random Access Memory chips (\u201cDRAM\u201d), Flash memory chips (\u201cNAND Flash\u201d) and CMOS Image Sensors (\u201cCIS\u201d) for a wide range of distinguished customers globally. The Company\u2019s shares are traded on the Korea Exchange, and the Global Depository shares are listed on the Luxemburg Stock Exchange. Further information about SK hynix is available at <a class=\"-as-ga\" href=\"http:\/\/www.skhynix.com\" target=\"_blank\" rel=\"noopener noreferrer\" data-ga-category=\"sk-hynix-newsroom\" data-ga-action=\"click\" data-ga-label=\"goto_http:\/\/www.skhynix.com\">www.skhynix.com<\/a>.<\/p>\n<p>\u00a0<\/p>\n<p><strong>Media Contact<\/strong><br \/>\nSK hynix Inc.<br \/>\nPublic Relations<\/p>\n<p>Senior Manager<br \/>\nSeongae Park<br \/>\nPhone: +82.2.3459.5325<br \/>\nE-Mail: <a class=\"email_link -as-ga\" href=\"mailto:seongae.park@sk.com\" data-ga-category=\"sk-hynix-newsroom\" data-ga-action=\"email\" data-ga-label=\"email_mailto:seongae.park@sk.com\">seongae.park@sk.com<\/a><\/p>\n","protected":false},"excerpt":{"rendered":"<p>SEOUL, Korea, December 19th, 2014 SK hynix Inc. (www.skhynix.com) today announced that it will jointly develop a process technology \u2018Nano Imprint Lithography (or \u2018NIL\u2019)\u2019 with Toshiba, a Japanese memory chip maker. NIL has been recognized as one of the next generation lithography techniques for implementing high throughput patterning at low costs unlike the traditional lithography [\u2026]<\/p>\n","protected":false},"author":23,"featured_media":3393,"comment_status":"closed","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"_migrated_source_id":1298,"footnotes":"","_members_access_role":[],"_members_access_error":""},"categories":[4],"tags":[506],"class_list":["post-5089","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-press","tag-toshiba"],"acf":[],"_links":{"self":[{"href":"https:\/\/news.skhynix.com\/en\/wp-json\/wp\/v2\/posts\/5089","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/news.skhynix.com\/en\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/news.skhynix.com\/en\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/news.skhynix.com\/en\/wp-json\/wp\/v2\/users\/23"}],"replies":[{"embeddable":true,"href":"https:\/\/news.skhynix.com\/en\/wp-json\/wp\/v2\/comments?post=5089"}],"version-history":[{"count":1,"href":"https:\/\/news.skhynix.com\/en\/wp-json\/wp\/v2\/posts\/5089\/revisions"}],"predecessor-version":[{"id":6518,"href":"https:\/\/news.skhynix.com\/en\/wp-json\/wp\/v2\/posts\/5089\/revisions\/6518"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/news.skhynix.com\/en\/wp-json\/wp\/v2\/media\/3393"}],"wp:attachment":[{"href":"https:\/\/news.skhynix.com\/en\/wp-json\/wp\/v2\/media?parent=5089"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/news.skhynix.com\/en\/wp-json\/wp\/v2\/categories?post=5089"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/news.skhynix.com\/en\/wp-json\/wp\/v2\/tags?post=5089"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}